Inventor · San Jose, CA, US

Garrett H. Sin

17Patents
6h-index
45Co-inventors
62Inventor score

Filing activity: Oct 11, 2008 → Feb 27, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US8372210B2 Post CMP scrubbing of substrates Electricity 12 Active
US8774958B2 Selection of polishing parameters to generate removal profile Physics 8 Active
US9213340B2 Selection of polishing parameters to generate removal or pressure profile Physics 7 Active
US7980000B2 Vapor dryer having hydrophilic end effector Emerging Cross-Sectional Technologies 7 Active
US8628376B2 In-line wafer thickness sensing Electricity 7 Active
US10493590B2 Selection of polishing parameters to generate removal or pressure profile Physics 6 Active
US8205352B2 Vapor dryer having hydrophilic end effector Emerging Cross-Sectional Technologies 5 Active
US8202738B2 Endpoint method using peak location of modified spectra Electricity 4 Active
US11853042B2 Part, sensor, and metrology data integration Physics 1 Active
US11592812B2 Sensor metrology data integration Emerging Cross-Sectional Technologies 1 Active
US9873179B2 Carrier for small pad for chemical mechanical polishing Performing Operations; Transporting 0 Active
US12366853B2 Sensor metrology data integration Emerging Cross-Sectional Technologies 0 Active
US10610994B2 Polishing system with local area rate control and oscillation mode Electricity 0 Active
US10434623B2 Local area polishing system and polishing pad assemblies for a polishing system Performing Operations; Transporting 0 Active
US10252397B2 Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes Performing Operations; Transporting 0 Active
US11241769B2 Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes Performing Operations; Transporting 0 Active
US11157661B2 Process development visualization tool Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.