Fluorinated monomer, fluorinated polymer, resist composition and patterning process
US7981589B2 · kind B2 · utility
19Cited by
12References
5Claims
0Family size
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Key dates
| Filing date | Jun 25, 2008 |
| Grant date | Jul 19, 2011 |
| Priority date | — |
| Expiry date | Jul 7, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R1 is H or monovalent C1-C20 hydrocarbon group, R2 is H, F, methyl or trifluoromethyl, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, or R3 and R4 may form an aliphatic hydrocarbon ring, and A is a divalent C1-C6 hydrocarbon group
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.