Semiconductor device including stress relaxation gaps for enhancing chip package interaction stability
US7982313B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 22, 2009 |
| Grant date | Jul 19, 2011 |
| Priority date | — |
| Expiry date | Jul 22, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/1433
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
By dividing a single chip area into individual sub-areas, a thermally induced stress in each of the sub-areas may be reduced during operation of complex integrated circuits, thereby enhancing the overall reliability of complex metallization systems comprising low-k dielectric materials or ULK material. Consequently, a high number of stacked metallization layers in combination with increased lateral dimensions of the semiconductor chip may be used compared to conventional strategies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.