Method for fabricating self-aligned nanostructure using self-assembly block copolymers, and structures fabricated therefrom
US7993816B2 · kind B2 · utility
9Cited by
1References
16Claims
0Family size
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Key dates
| Filing date | Mar 17, 2008 |
| Grant date | Aug 9, 2011 |
| Priority date | — |
| Expiry date | Mar 4, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
In one embodiment, the present invention provides a method for patterning a surface that includes forming a block copolymer atop a heterogeneous reflectivity surface, wherein the block copolymer is segregated into first and second units; applying a radiation to the first units and second units, wherein the heterogeneous reflectivity surface produces an exposed portion of the first units and the second units; and applying a development cycle to selectively remove at least one of the exposed first and second units of the segregated copolymer film to provide a pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.