DC and RF hybrid processing system
US7993937B2 · kind B2 · utility
17Cited by
20References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2010 |
| Grant date | Aug 9, 2011 |
| Priority date | — |
| Expiry date | Sep 22, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3299
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention can provide apparatus and methods for processing substrates and/or wafers in real-time using at least one Direct Current (DC)/Radio Frequency (RF) Hybrid (DC/RFH) processing system and associated Direct Current/Radio Frequency Hybrid (DC/RFH) procedures and DC/RFH process parameters and/or DC/RFH models.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.