Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control
US7999479B2 · kind B2 · utility
3Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 16, 2009 |
| Grant date | Aug 16, 2011 |
| Priority date | — |
| Expiry date | Apr 21, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion source, capable of generating high-density wide ribbon ion beam, utilizing one or more plasma sources is disclosed. In addition to the plasma source(s), the ion source also includes a diffusion chamber. The diffusion chamber has an extraction aperture oriented along the same axis as the dielectric cylinder of the plasma source. In one embodiment, dual plasma sources, located on opposing ends of the diffusion chamber are used to create a more uniform extracted ion beam. In a further embodiment, a multicusp magnetic field is used to further improve the uniformity of the extracted ion beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.