Lithographic apparatus and sensor calibration method
US7999912B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 8, 2007 |
| Grant date | Aug 16, 2011 |
| Priority date | — |
| Expiry date | Jun 12, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70516
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.