Methods and systems for generating information to be used for selecting values for one or more parameters of a detection algorithm
US8000922B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 29, 2008 |
| Grant date | Aug 16, 2011 |
| Priority date | — |
| Expiry date | Dec 19, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8854
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.