Extreme ultraviolet light source apparatus and nozzle protection device
US8003962B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2009 |
| Grant date | Aug 23, 2011 |
| Priority date | — |
| Expiry date | Oct 27, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0023
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.