Extreme ultraviolet light source apparatus
US8003963B2 · kind B2 · utility
13Cited by
2References
23Claims
0Family size
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Inventors
Key dates
| Filing date | Oct 26, 2009 |
| Grant date | Aug 23, 2011 |
| Priority date | — |
| Expiry date | Feb 13, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.