Two-zone ion beam carbon deposition
US8008632B2 · kind B2 · utility
0Cited by
11References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 24, 2008 |
| Grant date | Aug 30, 2011 |
| Priority date | — |
| Expiry date | Jul 31, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/8408
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates an ion source for ion beam deposition comprising multiple anodes, wherein the ion source deposits multiple zones of a source material and thicknesses of at least two of the multiple zones are different.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.