Compositions and processes for photolithography
US8012666B2 · kind B2 · utility
3Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2007 |
| Grant date | Sep 6, 2011 |
| Priority date | — |
| Expiry date | Mar 12, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.