Dynamic adaptive sampling rate for model prediction
US8017411B2 · kind B2 · utility
12Cited by
12References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 18, 2002 |
| Grant date | Sep 13, 2011 |
| Priority date | — |
| Expiry date | Sep 11, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and an apparatus for dynamically adjusting a sampling rate relating to wafer examination. A process step is performed upon a plurality of workpieces associated with a lot. A sample rate for acquiring metrology data relating to at least one of the processed workpiece is determined. A dynamic sampling rate adjustment process is performed to adaptively modify the sample rate. The dynamic sampling rate adjustment process includes comparing a predicted process outcome and an actual process outcome and modifying the sampling rate based upon the comparison.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.