Method and apparatus to reduce defects in liquid based PECVD films
US8017527B1 · kind B1 · utility
34Cited by
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27Claims
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Key dates
| Filing date | Dec 16, 2008 |
| Grant date | Sep 13, 2011 |
| Priority date | — |
| Expiry date | Aug 20, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatuses and methods for diverting a flow of a liquid precursor during flow stabilization and plasma stabilization stages during PECVD processes are effective at eliminating particle defects in PECVD films deposited using a liquid precursor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.