Ming Li
26Patents
11h-index
54Co-inventors
78Inventor score
Filing activity: Sep 27, 1995 → Mar 26, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8728956B2 | Plasma activated conformal film deposition | Electricity | 520 | Active |
| US8524612B2 | Plasma-activated deposition of conformal films | Electricity | 378 | Active |
| US8101531B1 | Plasma-activated deposition of conformal films | Electricity | 79 | Active |
| US9230800B2 | Plasma activated conformal film deposition | Electricity | 40 | Active |
| US5960311A | Method for forming controlled voids in interlevel dielectric | Electricity | 39 | Expired |
| US8017527B1 | Method and apparatus to reduce defects in liquid based PECVD films | Chemistry; Metallurgy | 34 | Active |
| US5847464A | Method for forming controlled voids in interlevel dielectric | Electricity | 32 | Expired |
| US9034142B2 | Temperature controlled showerhead for high temperature operations | Chemistry; Metallurgy | 24 | Active |
| US8444092B2 | Metal sheets and plates having friction-reducing textured surfaces and methods of manufacturing same | Emerging Cross-Sectional Technologies | 18 | Active |
| US9328416B2 | Method for the reduction of defectivity in vapor deposited films | Chemistry; Metallurgy | 16 | Active |
| US8578747B2 | Metal sheets and plates having friction-reducing textured surfaces and methods of manufacturing same | Emerging Cross-Sectional Technologies | 11 | Active |
| US9297394B2 | Metal sheets and plates having friction-reducing textured surfaces and methods of manufacturing same | Emerging Cross-Sectional Technologies | 10 | Active |
| US6720251B1 | Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing | Electricity | 8 | Expired |
| US5820999A | Trimmed aluminum sheet | Emerging Cross-Sectional Technologies | 8 | Expired |
| US7642202B1 | Methods of forming moisture barrier for low k film integration with anti-reflective layers | Electricity | 6 | Expired |
| US7455004B2 | Apparatus and method for cutting sheet material | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6976414B2 | Method and apparatus for trimming aluminum sheet | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6992388B2 | Formation of micro rough polysurface for low sheet resistant salicided sub-quarter micron polylines | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7430951B1 | Method and apparatus for trimming aluminum sheet to reduce slivers and improve edge quality | Emerging Cross-Sectional Technologies | 3 | Expired |
| US8628618B2 | Precursor vapor generation and delivery system with filters and filter monitoring system | Emerging Cross-Sectional Technologies | 3 | Active |
| US7052988B1 | Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing | Electricity | 3 | Expired |
| US8003549B1 | Methods of forming moisture barrier for low K film integration with anti-reflective layers | Electricity | 0 | Active |
| US9637821B2 | Method for supplying vaporized precursor | Emerging Cross-Sectional Technologies | 0 | Active |
| US9064693B2 | Deposition of thin film dielectrics and light emitting nano-layer structures | Electricity | 0 | Active |
| US12014921B2 | Plasma enhanced wafer soak for thin film deposition | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.