Capacitively coupled plasma reactor
US8018163B2 · kind B2 · utility
12Cited by
6References
40Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 5, 2008 |
| Grant date | Sep 13, 2011 |
| Priority date | — |
| Expiry date | Sep 28, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32532
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A capacitively coupled plasma reactor includes a plasma reactor, a capacitive coupling electrode assembly including a plurality of capacitive coupling electrodes to induce plasma discharge inside the plasma reactor, a main power supply source to supply radio-frequency power, and a distribution circuit to receive the radio-frequency power supplied from the main power supply source and to distribute the received radio-frequency power to the plurality of capacitive coupling electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.