Apparatus and method for batch non-contact material characterization
US8022372B2 · kind B2 · utility
7Cited by
4References
34Claims
0Family size
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Key dates
| Filing date | Feb 12, 2009 |
| Grant date | Sep 20, 2011 |
| Priority date | — |
| Expiry date | Jul 21, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1008
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for performing non-contact material characterization includes a wafer carrier adapted to hold a plurality of substrates and a material characterization device, such as a device for performing photoluminescence spectroscopy. The apparatus is adapted to perform non-contact material characterization on at least a portion of the wafer carrier, including the substrates disposed thereon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.