Radiation-sensitive resin composition
US8026039B2 · kind B2 · utility
1Cited by
2References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2007 |
| Grant date | Sep 27, 2011 |
| Priority date | — |
| Expiry date | Sep 19, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern.wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n represents an integer from 1 to 5.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.