Substrate treating apparatus and exposing apparatus for cleaning a chuck cleaning tool with treating bath
US8027017B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 15, 2009 |
| Grant date | Sep 27, 2011 |
| Priority date | — |
| Expiry date | Sep 6, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67057
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.