Film formation method and apparatus
US8029856B2 · kind B2 · utility
3Cited by
1References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 11, 2007 |
| Grant date | Oct 4, 2011 |
| Priority date | — |
| Expiry date | May 15, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A film formation method is arranged to react carboxylic acid with an oxygen-containing metal compound to produce carboxylate salt gas of a metal of the metal compound. The method then supplies the carboxylate salt gas of the metal onto a substrate. The method applies energy to the substrate to decompose the carboxylate salt of the metal supplied onto the substrate, thereby forming a metal film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.