Lithographic method and carrier substrate
US8029973B2 · kind B2 · utility
1Cited by
10References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 24, 2008 |
| Grant date | Oct 4, 2011 |
| Priority date | — |
| Expiry date | Dec 18, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/707
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.