Patent · US Active

Charged particle-optical systems, methods and components

US8039813B2 · kind B2 · utility

21Cited by

13References

57Claims

0Family size

Assignees

Carl Zeiss SMT GmbH · DE
Applied Materials Israel Ltd. · IL

Inventors

Antonio Casares · Aalen, DE
Thomas Kemen · Meppen, DE
Rainer Knippelmeyer · Utting am Ammersee, DE
Thomas Bayer · Igersheim, DE
Georg Fritz · Lörrach, DE
Johann Greschner · Neckartenzlingen, DE
Samuel Kalt · Reutlingen, DE

Key dates

Filing date	Sep 6, 2006
Grant date	Oct 18, 2011
Priority date	—
Expiry date	Feb 11, 2028

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31774
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.