Patent · US Active

Low thermal mass semiconductor wafer support

US8042697B2 · kind B2 · utility

8Cited by
24References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 30, 2008
Grant dateOct 25, 2011
Priority date
Expiry dateJul 28, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67309
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A support for a semiconductor wafer includes a plate having a support surface for supporting the wafer and a recessed surface spaced from the support surface and spaced from the wafer. A plurality of holes extends from the recessed surface, and the support surface is free of holes to inhibit contamination of the wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.