Systems and methods for acquiring information about a defect on a specimen
US8045145B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 6, 2007 |
| Grant date | Oct 25, 2011 |
| Priority date | — |
| Expiry date | Mar 17, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/95607
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for acquiring information about a defect on a specimen are provided. One system includes an optical subsystem configured to acquire topography information about the defect. The system also includes an electron beam subsystem configured to acquire additional information about the defect. One method includes acquiring first data for the defect using an optical technique and second data for the defect using an electron beam technique. The first and second data is acquired while the specimen is disposed in a single vacuum chamber. The method also includes determining topography information about the defect from the first data. In addition, the method includes determining additional information about the defect from the second data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.