Bright and dark field scatterometry systems for line roughness metrology
US8045179B1 · kind B1 · utility
8Cited by
6References
25Claims
0Family size
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Key dates
| Filing date | Nov 20, 2008 |
| Grant date | Oct 25, 2011 |
| Priority date | — |
| Expiry date | Nov 20, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Line edge roughness or line width roughness of a feature on a sample may be determined from incident radiation scattered from the feature. An amount of ordered scattered radiation characterized by a discrete diffraction order is determined and a diffuse scattered radiation signal is measured. A ratio between an intensity of the ordered scattered incident radiation and an intensity of the diffuse scattered radiation signal is determined. The line edge roughness or line width roughness is determined from the ratio.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.