Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process
US8050898B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 8, 2007 |
| Grant date | Nov 1, 2011 |
| Priority date | — |
| Expiry date | Sep 2, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of generating a model for simulating the imaging performance of an optical imaging system. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; defining a first model representing the imaging performance of the optical imaging system and the process, and calibrating the model, where the first model generates values corresponding to a latent image slope. The method further includes the step of defining a second model for estimating a line width roughness of a feature to be imaged, where the second model utilizes the latent image slope values to estimate the line width roughness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.