Maskless vortex phase shift optical direct write lithography
US8057963B2 · kind B2 · utility
1Cited by
3References
26Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 14, 2004 |
| Grant date | Nov 15, 2011 |
| Priority date | — |
| Expiry date | Aug 11, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides methods and apparatus for accomplishing a optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is configured to generate vortex phase shift optical patterns that are directed onto a photosensitive layer of a substrate. The lithography methods and systems facilitate pattern transfer using such vortex phase shift exposure patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.