Masking device, lithographic apparatus, and device manufacturing method
US8059261B2 · kind B2 · utility
7Cited by
15References
63Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 28, 2004 |
| Grant date | Nov 15, 2011 |
| Priority date | — |
| Expiry date | Dec 31, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70858
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to obscure said part of said patterning device in a first direction and a second masking structure to obscure said part in a second different direction, wherein said first and second masking structure are disposed in the vicinity of said focal plane in a mechanically uncoupled arrangement with respect to each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.