Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure
US8064037B2 · kind B2 · utility
2Cited by
10References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 17, 2006 |
| Grant date | Nov 22, 2011 |
| Priority date | — |
| Expiry date | Aug 2, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes: a liquid supply system that supplies the liquid onto the substrate and a liquid recovery system that recovers the liquid having been supplied on the substrate. When the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery system does not perform recovery of the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.