Method and system for determining a defect during charged particle beam inspection of a sample
US8068662B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2009 |
| Grant date | Nov 29, 2011 |
| Priority date | — |
| Expiry date | May 29, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for determining a defect during charged particle beam inspection of a sample locates at least one examination region within a charged particle microscopic image of the sample by making reference to a database graphic of the sample corresponding to the charged particle microscopic image. Each located examination region concerns at least one element of the sample, and each element has at least one characteristic in common. At least one point response value is then generated for each point in the located examination regions. The presence of a defect at the location of the concerned point is then determined by applying at least one decision tree operator to the generated point response values of the concerned point. Applications of the proposed method as a computing agent and a charged particle beam inspection system are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.