Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target
US8070925B2 · kind B2 · utility
32Cited by
2References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2008 |
| Grant date | Dec 6, 2011 |
| Priority date | — |
| Expiry date | May 12, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3455
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a PVD reactor having a sputter target at the ceiling, a conductive housing enclosing the rotating magnet assembly has a central port for the rotating magnet axle. A conductive hollow cylinder of the housing surrounds an external portion of the spindle. RF power is coupled to a radial RF connection rod extending radially from the hollow cylinder. DC power is coupled to another radial DC connection rod extending radially from the hollow cylinder.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.