Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing
US8075698B2 · kind B2 · utility
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8References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 28, 2003 |
| Grant date | Dec 13, 2011 |
| Priority date | — |
| Expiry date | Oct 2, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/26
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.