Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor
US8080760B2 · kind B2 · utility
30Cited by
6References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2010 |
| Grant date | Dec 20, 2011 |
| Priority date | — |
| Expiry date | Jul 12, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32091
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing chamber includes a cantilever assembly configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.