Patent · US Active

Apparatus for treating a substrate

US8083911B2 · kind B2 · utility

2Cited by

7References

12Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Markus Hanika · Landsberg, DE
Tobias Stolley · Oberursel, DE

Key dates

Filing date	Feb 14, 2008
Grant date	Dec 27, 2011
Priority date	—
Expiry date	May 5, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3438
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

This invention relates to an apparatus (1) for treating, e.g. coating, a substrate (35, 39) in a vacuum chamber (2). In this vacuum chamber (2) there are arranged n cathodes (7-10) and n+1 anodes (28-32), each of said anodes adjacent to a cathode (7-10). Each of the n cathodes (7-10) and n of the assigned anodes (29-32) are connected to a power supply (11-14). One of the anodes (28) not being assigned to a cathode (7-10) is connected to an electrical line (63) which is connecting each of the anodes (28-32). A pull-down resistor (34) is connected to said line (63) at its one end and to ground (33) at its other end.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.