Movable injectors in rotating disc gas reactors
US8092599B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 10, 2007 |
| Grant date | Jan 10, 2012 |
| Priority date | — |
| Expiry date | Oct 25, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45589
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system and method for uniform deposition of material layers on wafers in a rotating disk chemical vapor deposition reaction system is provided, wherein one or more substrates are rotated on a carrier about an axis while maintaining surfaces of the one or more substrates substantially perpendicular to the axis of rotation and facing in an upstream direction along the axis of rotation. During rotating a first gas is discharged in the downstream direction towards the one or more substrates from a first set of gas inlets. A second gas is discharged in the downstream direction towards the one or more substrates from at least one movable gas injector, and the at least one movable gas inlet is moved with a component of motion in a radial direction towards or away from the axis of rotation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.