Patent · US Active

Deposition of ternary oxide films containing ruthenium and alkali earth metals

US8092721B2 · kind B2 · utility

7Cited by
4References
9Claims
0Family size

Assignees

Inventors

Key dates

Filing dateMar 26, 2009
Grant dateJan 10, 2012
Priority date—
Expiry dateJan 29, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/45553
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Methods and compositions for the deposition of ternary oxide films containing ruthenium and an alkali earth metal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.