Lithographic appararus and method

US8094287B2 · kind B2 · utility

Assignees

• ASML NETHERLANDS B.V. · NL
• Carl Zeiss SMT GmbH · DE

Inventors

• Tjarko Adriaan Rudolf Van Empel · Eindhoven, NL
• Erik Roelof Loopstra · Geldrop, NL
• Antonius Johannes Van Der Net · Tilburg, NL
• Yuri Johannes Gabriël Van De Vijver · Best, NL
• Bernhard Gellrich · Aalen, DE
• Bauke Jansen · Deurne, NL
• Rens Sanderse · Eindhoven, NL

Key dates

• Filing date: Sep 25, 2008
• Grant date: Jan 10, 2012
• Expiry date: Jul 18, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70908
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.