Multiple nozzle gas cluster ion beam processing system and method of operating
US8097860B2 · kind B2 · utility
5Cited by
14References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 26, 2010 |
| Grant date | Jan 17, 2012 |
| Priority date | — |
| Expiry date | Sep 9, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0827
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas cluster ion beam (GCIB) processing system using multiple nozzles for forming and emitting at least one GCIB and methods of operating thereof are described. The GCIB processing system may be configured to treat a substrate, including, but not limited to, doping, growing, depositing, etching, smoothing, amorphizing, or modifying a layer thereupon. Furthermore, the GCIB processing system may be operated to produce a first GCIB and a second GCIB, and to irradiate a substrate simultaneously and/or sequentially with the first GCIB and second GCIB.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.