Method and system for evaluating an evaluated pattern of a mask
US8098926B2 · kind B2 · utility
1Cited by
1References
27Claims
0Family size
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Key dates
| Filing date | Jan 8, 2008 |
| Grant date | Jan 17, 2012 |
| Priority date | — |
| Expiry date | Nov 18, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.