Resist composition and patterning process
US8101335B2 · kind B2 · utility
13Cited by
17References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 11, 2009 |
| Grant date | Jan 24, 2012 |
| Priority date | — |
| Expiry date | Mar 26, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.