Methods and apparatus for detecting a substrate notch or flat
US8101934B2 · kind B2 · utility
2Cited by
3References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 7, 2007 |
| Grant date | Jan 24, 2012 |
| Priority date | — |
| Expiry date | Aug 17, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01V8/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In a first aspect, a first apparatus is provided. The first apparatus includes a through-beam sensor coupled to a scrubber and adapted to detect a notch or flat of a substrate in the scrubber during processing. The through-beam sensor has (1) an emitter facing a first major surface of a substrate in the scrubber and adapted to transmit a beam toward an edge of the first major surface; and (2) a receiver facing a second major surface of the substrate and adapted to receive the beam transmitted from the emitter when the edge of the substrate does not obstruct the beam. Numerous other aspects are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.