Patent · US Active

Immersion lithography fluid control system using an electric or magnetic field generator

US8102501B2 · kind B2 · utility

1Cited by

20References

44Claims

0Family size

Assignee

NIKON CORPORATION · JP

Inventors

Derek Coon · Redwood City, US
Andrew J. Hazelton · Tokyo, JP

Key dates

Filing date	Jul 25, 2007
Grant date	Jan 24, 2012
Priority date	—
Expiry date	Jul 25, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70808
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member, a fluid-supplying device which provides an immersion liquid to the gap, and a field generator which generates a magnetic field or an electric field such that the immersion liquid is subjected to the magnetic or electric field generated by the field generator.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.