Exposure apparatus and device fabrication method
US8111373B2 · kind B2 · utility
3Cited by
60References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 23, 2005 |
| Grant date | Feb 7, 2012 |
| Priority date | — |
| Expiry date | Sep 25, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member (70) having a supply outlet (12) that supplies a liquid (LQ) and a collection inlet (22) that collects a liquid (LQ), and a vibration isolating mechanism (60) that supports the nozzle member (70) and vibrationally isolates the nozzle member (70) from a lower side step part (7) of a main column (1).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.