Photoacid generator, resist composition, and patterning process
US8114570B2 · kind B2 · utility
15Cited by
20References
16Claims
0Family size
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Key dates
| Filing date | Mar 24, 2009 |
| Grant date | Feb 14, 2012 |
| Priority date | — |
| Expiry date | Aug 17, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation.ROC(═O)R1—COOCH2CF2SO3−H+ (1a)RO is OH or C1-C20 organoxy, R1 is a divalent C1-C20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.