Lithographic apparatus and device manufacturing method
US8115900B2 · kind B2 · utility
3Cited by
3References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 17, 2007 |
| Grant date | Feb 14, 2012 |
| Priority date | — |
| Expiry date | Feb 21, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0094
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.