Patent · US Active

Variable resist protecting groups

US8129080B2 · kind B2 · utility

10Cited by

21References

19Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Carlos A. Fonseca · Lagrangeville, US
Mark H. Somervell · Richardson, US
Steven Scheer · Austin, US

Key dates

Filing date	Sep 16, 2009
Grant date	Mar 6, 2012
Priority date	—
Expiry date	Sep 18, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/325
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.