Colored mask combined with selective area deposition
US8129098B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 20, 2007 |
| Grant date | Mar 6, 2012 |
| Priority date | — |
| Expiry date | Jan 4, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/0241
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to visible light; (d) patterning the first layer by exposing the first layer through the color mask with visible light to form a first pattern and developing the deposition inhibitor material to provide selected areas of the first layer effectively not having the deposition inhibitor material; and (e) depositing a second layer of functional material over the transparent support; wherein the second layer of functional material is substantially deposited only in selected areas over the transparent support not having the deposition inhibitor material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.