Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
US8130364B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2007 |
| Grant date | Mar 6, 2012 |
| Priority date | — |
| Expiry date | Aug 29, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70475
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a′, which orthogonally projects point a on the plate, and a second line segment linking point B and point b′, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.