Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process

US8132130B2 · kind B2 · utility

Assignee

• ASML Masktools B.V. · NL

Inventors

• Jang Fung Chen · Cupertino, US
• Duan-Fu Stephen Hsu · Fremont, US
• Douglas Van Den Broeke · Sunnyvale, US
• Thomas Laidig · Richmond, US

Key dates

• Filing date: Jun 22, 2006
• Grant date: Mar 6, 2012
• Expiry date: Aug 19, 2029

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/70
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for forming exposure masks for imaging a target pattern having features to be imaged on a substrate in a multi-exposure process. The method includes the steps of generating a set of decomposition rules defining whether a given feature of the target pattern is assigned to a first exposure mask or a second exposure mask; applying the decomposition rules to each of the features in the target pattern so as to assign each of the features in the target pattern to one of the first exposure mask or second exposure mask; and generating the first exposure mask and the second exposure mask containing the respective features assigned to each mask.