Superior fill conditions in a replacement gate approach by performing a polishing process based on a sacrificial fill material

US8138038B2 · kind B2 · utility

Assignee

• GlobalFoundries Inc. · KY

Inventors

• Jens Heinrich · Radeberg, DE
• Gerd Marxsen · Radebeul, DE
• Katja Steffen · Dresden, DE

Key dates

• Filing date: Sep 29, 2010
• Grant date: Mar 20, 2012
• Expiry date: Oct 15, 2030

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10D64/691

Abstract

In a replacement gate approach, a top area of a gate opening may receive a superior cross-sectional shape after the deposition of a work function adjusting species on the basis of a polishing process, wherein a sacrificial material may protect the sensitive materials in the gate opening.